Optimized lithography and etching processes for a magnetic oxide micro‐device - Normandie Université Access content directly
Journal Articles physica status solidi (c) Year : 2004

Dates and versions

hal-03544993 , version 1 (27-01-2022)

Identifiers

Cite

Wilfrid Prellier, R. Soulimane, M. Koubaa, A. Haghiri‐gosnet, B. Mercey, et al.. Optimized lithography and etching processes for a magnetic oxide micro‐device. physica status solidi (c), 2004, 1 (7), pp.1687-1690. ⟨10.1002/pssc.200304426⟩. ⟨hal-03544993⟩
6 View
0 Download

Altmetric

Share

Gmail Facebook X LinkedIn More