SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition - Normandie Université Access content directly
Journal Articles Applied physics. A, Materials science & processing Year : 2011

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hal-02887893 , version 1 (02-07-2020)

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L. Yan, Z. Xu, C. Grygiel, S. Mcmitchell, M. Suchomel, et al.. SrHf0.67Ti0.33O3 high-k films deposited on Si by pulsed laser deposition. Applied physics. A, Materials science & processing, 2011, 104 (1), pp.447-451. ⟨10.1007/s00339-011-6257-8⟩. ⟨hal-02887893⟩
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