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Article Dans Une Revue Journal of Applied Physics Année : 2020

Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor

Résumé

p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using 57Fe Conversion Electron Mössbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a 57Fe atoms concentration close to 2% is not only due to the formation of some Fe–Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined.
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Dates et versions

hal-02568971 , version 1 (10-05-2020)

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Lindor Diallo, Abdeslem Fnidiki, Luc Lechevallier, Jean Juraszek, M. Viret, et al.. Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor. Journal of Applied Physics, 2020, 127 (18), pp.183901. ⟨10.1063/5.0005061⟩. ⟨hal-02568971⟩
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