Characterization of p-type Doping in Silicon Nanocrystals Embedded in SiO 2 - Normandie Université Access content directly
Conference Papers Year : 2019

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hal-02294165 , version 1 (23-09-2019)

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Rémi Demoulin, Manuel Roussel, Sébastien Duguay, D. Muller, D. Mathiot, et al.. Characterization of p-type Doping in Silicon Nanocrystals Embedded in SiO 2. Microscopy & Microanalysis 2019, Aug 2019, Portland, United States. pp.2540-2541, ⟨10.1017/S1431927619013436⟩. ⟨hal-02294165⟩
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