Optimized sub-40 nm planar patterning process for a La0.7Sr0.3MnO3 magnetic memory - Normandie Université Access content directly
Journal Articles Journal of Electroanalytical Chemistry Year : 2005

Optimized sub-40 nm planar patterning process for a La0.7Sr0.3MnO3 magnetic memory

Nguyen Hoa Hong
  • Function : Author
Awatef Hassini
  • Function : Author
V. Kulkarni
  • Function : Author
Hoa Hong Nguyen
  • Function : Author
E Rauwel Buzin
  • Function : Author
A.M. Haghiri-Gosnet
  • Function : Author
J.P. Renard
  • Function : Author
M. Veis
  • Function : Author
V. Kolinsky
  • Function : Author
S. Visnovsky
  • Function : Author
M. Darques
  • Function : Author
R. Soulimane
  • Function : Author

Dates and versions

hal-03544992 , version 1 (27-01-2022)

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Wilfrid Prellier, Nguyen Hoa Hong, Antoine Ruyter, Joe Sakai, Awatef Hassini, et al.. Optimized sub-40 nm planar patterning process for a La0.7Sr0.3MnO3 magnetic memory. Journal of Electroanalytical Chemistry, 2005, 584 (1), pp.34-37. ⟨10.1016/j.jelechem.2004.02.021⟩. ⟨hal-03544992⟩
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