Integrated optics Selenization Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Amorphous Atomic force microscopy Mott insulators Films Rutile X-ray diffraction Semiconductors Optical properties Vanadium Sesquioxide Optical interferometry PECVD Alloying Aluminium nitride Biocapteurs Sputtering Calcined clay XPS Kirkendall effect Annealing Biomembranes BOMBARDMENT NEXAFS Spectroscopic ellipsometry Mott insulator CNTs’ collapse A-CNx Magnetron sputtering Chalcogenide Residual stress Mass spectrometry Alzheimer's disease Titanium dioxide Scanning electron microscopy Oxides Transfert d'énergie Non-volatile memory Carbon Nanotube Functionalization Nanocomposite B2 Quaternary Applications industrielles TiO2 Plasma etching V2O3 Bixbyite Adsorption Band alignment Capacitance C Photoelectron spectroscopy Biofilms microbiens Bipolar resistive switching BRS A Chalcogenides Colloidal solution Physical vapor deposition SF 6 Resistive switching Band gap Sol-gel Thin film B2 Semiconducting indium compounds CaTiO3Pr^3^+ Buffer Couple Transmission electron microscopy Carbon A3 Physical vapor deposition processes AZO thin films Anatase Etching Optical waveguides A Thin films X-ray photoelectron spectroscopy Plasmas froids Amyloid precursor B3 Solar cells Copper Aryl-diazonium salts TEM Atomic layer etching CHLORINE PLASMAS Avalanche breakdown CH4 Ambipolar material Thin films AuCu alloy Ablation laser A Multilayers B Chemical synthesis 3 nm in size Nanotubes B1 Inorganic compounds Low-pressure plasma processing B2 Semiconducting alloys Biomasse AlN Structure CIGSe A1 Characterization